JPH0176032U - - Google Patents

Info

Publication number
JPH0176032U
JPH0176032U JP1987171326U JP17132687U JPH0176032U JP H0176032 U JPH0176032 U JP H0176032U JP 1987171326 U JP1987171326 U JP 1987171326U JP 17132687 U JP17132687 U JP 17132687U JP H0176032 U JPH0176032 U JP H0176032U
Authority
JP
Japan
Prior art keywords
microwaves
plasma processing
microwave plasma
sample
transmitting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1987171326U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0745959Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987171326U priority Critical patent/JPH0745959Y2/ja
Publication of JPH0176032U publication Critical patent/JPH0176032U/ja
Application granted granted Critical
Publication of JPH0745959Y2 publication Critical patent/JPH0745959Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP1987171326U 1987-11-11 1987-11-11 マイクロ波プラズマ処理装置 Expired - Lifetime JPH0745959Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987171326U JPH0745959Y2 (ja) 1987-11-11 1987-11-11 マイクロ波プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987171326U JPH0745959Y2 (ja) 1987-11-11 1987-11-11 マイクロ波プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPH0176032U true JPH0176032U (en]) 1989-05-23
JPH0745959Y2 JPH0745959Y2 (ja) 1995-10-18

Family

ID=31463060

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987171326U Expired - Lifetime JPH0745959Y2 (ja) 1987-11-11 1987-11-11 マイクロ波プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPH0745959Y2 (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01247575A (ja) * 1988-03-30 1989-10-03 Shimadzu Corp プラズマ処理装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61267324A (ja) * 1985-05-21 1986-11-26 Fuji Electric Co Ltd 乾式薄膜加工装置
JPS6377120A (ja) * 1986-09-19 1988-04-07 Mitsubishi Electric Corp プラズマ処理装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61267324A (ja) * 1985-05-21 1986-11-26 Fuji Electric Co Ltd 乾式薄膜加工装置
JPS6377120A (ja) * 1986-09-19 1988-04-07 Mitsubishi Electric Corp プラズマ処理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01247575A (ja) * 1988-03-30 1989-10-03 Shimadzu Corp プラズマ処理装置

Also Published As

Publication number Publication date
JPH0745959Y2 (ja) 1995-10-18

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